Knowledge Base

Everything you need to understand plasma technology all in one place.

Knowledge Articles

Plasma Cleaning of Silicon Wafers

Influence of Surface Roughness on the Dynamics and Crystallization of Vapor-Deposited Thin Films

Image credit: ACS Publications

Surface cleanliness is often the first step in the experimental study of new materials and methods. In this recent article from the University of Silesia, the Henniker HPT-100 Plasma Cleaner is used to remove trace organic contamination from the surface of silicon wafers that are utilised in substrate roughness studies relating to the vapor deposition of Ultra-Stable Glass (USG) which has applications in the fabrication of light-emitting diodes and organic field-effect transistors.

REQUEST A QUOTATION OR FURTHER INFORMATION

See what our customers have to say

"With the HPT-500, Henniker offers a plasma cleaner that is easy to use and effective in organic residue removal and surface activation. Whenever users can't find the right process parameters in the extensive manual, they can rely on the knowledgeable support of the Henniker engineers."

Jan-Joost Lankwarden - Senior Manufacturing Engineer

"The equipment was incredibly user-friendly — easy to set up ourselves, allowing us to integrate plasma treatment into our processes with minimal downtime. Henniker has proven to be a dependable partner; whenever we've encountered technical issues, their team has been extremely prompt in their response and efficient in servicing the machine."

Dr Joshua Paulinus - Technology Specialist

"In 2024, we needed a plasma cleaner for rapid prototyping and PDMS microfluidic bonding. Henniker Plasma quickly identified the right system and provided practical PDMS bonding guidance. The system was delivered within 8 days, enabling us to start R&D earlier than planned. Same-day technical support and protocols have greatly accelerated our research."

Aaron Teo - Vivid Dx

"The technical team at Henniker are very knowledgeable and supportive and always approachable. I have found it a pleasure to work with them."

Simon Baxter - BAE Systems, MAI

"Henniker guided us to choose the most suitable plasma unit for our application, ensured an accelerated delivery time & guided us through the very easy setup. We obtained quality results with their unit within minutes of setup & consistent results thereafter. The support they have provided has been rapid and helpful."

Dr Ravi Desai - Making Lab, Francis Crick Institute

"Henniker provided our team with excellent service during the course of our work together, the plasma cleaner arrived quickly and was installed with ease, giving us visible results from the outset and confirming that we made the right decision in choosing a local UK manufacturer."

Dr Panagiotis Manesiotis BSc MRSC - Queen’s University Belfast

"Our customers and operations demand reliability at every level and were a key factor in our decision to choose a UK based manufacturer of plasma treatment equipment."

Tom Doak - Trak Microwave

"Henniker’s after sales support is first class. They have always been extremely responsive if we have ever had need to call on them."

Steve Rackham - Teledyne

"Henniker’s plasma systems have delivered tangible benefits to us right from day one. The team there are very easy to work with."

Ian Bruce - Coopervision

"Henniker really stood out, both in their product range and technical knowledge. They are a great company to work with."

Karthik Nair - University of Bradford

"We are very impressed with the ease of use and reliability of our plasma unit and were producing results within minutes of setting it up."

Dr Neil Wilson - Warwick University

"Our collaborative work with the team at Henniker was a very positive experience and one that we look forward to developing further."

Ewen Kellar - TWI

"Henniker provided a tailored product to match our exact requirements. They are a pleasure to work with."

Dr Will Shu - Heriot Watt University