Rapid area deactivation for blocking atomic layer deposition processes using polystyrene brush layers
“Henniker plasma systems play an important role in preparing substrates by plasma cleaning prior to spin coating. In this article, researchers from Dublin City University show how polystyrene brush layers offer an interesting alternative to other area selective deposition methods for next generation semiconductor fabrication.”
Keywords
- Area Selective Deposition
- Polystyrene brush
- Plasma cleaning
- Spin coating