The National Physical Laboratory (NPL) invest in plasma RIE system for thin film device research

Plasma RIE system for thin film device

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The National Physical Laboratory (NPL) is the UK’s National Measurement Institute and is a world-leading centre of excellence in developing and applying the most accurate measurement standards, science and technology available.

Henniker were contacted by a team at NPL who are currently researching the development and characterization of multiferroic materials for device applications.

A number of experimental techniques are being used and a new facility has been put into place for this purpose.

We were asked to help develop a bench-top Reactive Ion Etching (RIE) process for PNZT thin film devices. Working closely with the team at NPL we undertook a number of trials on a range of devices and quickly developed a reliable and repeatable process. This is part of a free service in which we work hand in hand with customers to demonstrate that we can deliver not only a working plasma machine but a tailored process that produces the desired results straight out of the box.

The resulting device tests confirmed that the process was matched to the desired requirements and from this we were able to supply the team at NPL with a system which delivered results from day 1.

RIE system: for more information on Reactive Ion Etching please visit our technology pages

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